Sidewall angle tuning in focused electron beam-induced processing

• Sangeetha Hari,
• Willem F. van Dorp,
• Johannes J. L. Mulders,
• Piet H. F. Trompenaars,
• Pieter Kruit and
• Cornelis W. Hagen

Beilstein J. Nanotechnol. 2024, 15, 447–456, doi:10.3762/bjnano.15.40

• ; FEBIP; side wall angle; Introduction Focused electron beam-induced processing (FEBIP) is a technique in which a focused electron beam is directed onto a substrate with an adsorbed layer of precursor molecules. The precursor molecules are supplied from a gas injection system through a nozzle at close